| 摘要 |
PURPOSE:To improve the accuracy of analysis and the efficiency of analyzing operation by supplying the element value of an element value setting means corresponding to a layer frequency setting means to an analyzing means when the set frequency of the layer frequency setting means reaches the counted value of a layer counter. CONSTITUTION:When the set frequencies of layer frequency setting means 141 - 14n reach the counted value of the counter 12 which counts the frequency of a layer corresponding to the ion beam scan, the element values of element value setting means 161 - 16n corresponding to the frequency setting means 141 - 14n are supplied to the analyzing means. Consequently, the element values are switched according to the frequency of the layer corresponding to an ion beam scan and while many kinds of secondary ion are classified by many elements, an analysis is taken to improve the accuracy of the analytic result of the part which has complicate structure nearby the surface of a body 9 to be measured or on the border surface of a multi-layered film and also improve the efficiency of the analyzing operation. |
