发明名称 |
PROCESS AND APPARATUS FOR PREPARING SUPERCONDUCTING THIN FILMS |
摘要 |
A process for preparing a thin film of high-temperature compound oxide superconductor on a substrate by magnetron sputtering method. A substrate and a target are arranged in parallel with each other in a vacuum chamber and one of the substrate and the target is moved relatively and in parallel with another during the thin film is formed by sputtering. |
申请公布号 |
AU7923091(A) |
申请公布日期 |
1992.01.02 |
申请号 |
AU19910079230 |
申请日期 |
1991.06.21 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD |
发明人 |
HIDEO ITOZAKE;HISAO HATTORI;KEIZO HARADA;KENJIRO HIGAKI |
分类号 |
H01L39/24 |
主分类号 |
H01L39/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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