发明名称 PROCESS AND APPARATUS FOR PREPARING SUPERCONDUCTING THIN FILMS
摘要 A process for preparing a thin film of high-temperature compound oxide superconductor on a substrate by magnetron sputtering method. A substrate and a target are arranged in parallel with each other in a vacuum chamber and one of the substrate and the target is moved relatively and in parallel with another during the thin film is formed by sputtering.
申请公布号 AU7923091(A) 申请公布日期 1992.01.02
申请号 AU19910079230 申请日期 1991.06.21
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD 发明人 HIDEO ITOZAKE;HISAO HATTORI;KEIZO HARADA;KENJIRO HIGAKI
分类号 H01L39/24 主分类号 H01L39/24
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