| 摘要 |
PURPOSE:To obtain the ionizing radiation sensitive resist material which is excellent in both of sensitivity and definition by incorporating a part corresponding to an acid generating agent into the resin itself of a base material. CONSTITUTION:This resist material contains the polymer having at least one kind of the substituents selected from a phenyl sulfonyl group and substd. phenyl sulfonyl group, 1 to 6C alkyl sulfonyl group and RCOO- group (where R denotes H or 1 to 6C alkyl group) in the structure. In addition, the material contains the polymer having the substituent of a group -COOL and/or -OL [where L denotes -CR<1>R<2>R<3>, -NR<1>R<2>, -SiR<1>R<2>R<3> or -PR<1>R<2>R<3>R<4> (where at least two of R<1> to R<4> denote 1 to 12C alkyl group, phenyl group, etc.)]. The ionizing radiation sensitive resist material which is excellent in both the sensitivity and the definition is obtd. in this way. |
