发明名称 WAFER TRANSFER METHOD AND DEVICE
摘要 <p>PURPOSE: To realize and maintain a clean processing environment without the bad influence to a cost and a wafer and the restriction to the freedom of a system design, at the transfer time of the wafer of a semiconductor. CONSTITUTION: The wafer 106 of a semiconductor is supported by the movable member 108 for transfering and a gas is supplied to the upperside of the wafer 106 surface therein after forming a control environment isolated from the surrounding environment by an environment control unit 120 and under this state, the wafer 106 is transfered from a certain location 104 to another location 104.</p>
申请公布号 JPH04243741(A) 申请公布日期 1992.08.31
申请号 JP19910188033 申请日期 1991.07.01
申请人 MACHINE TECHNOL INC 发明人 GIYARII HIRUMAN
分类号 B65D81/20;B65H3/14;B65H5/22;H01L21/677;H01L21/683 主分类号 B65D81/20
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