CHEMICALLY AMPLIFIED POSITIVE PHOTO RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN,申请号KR20077017294-传众专利搜索

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发明名称	CHEMICALLY AMPLIFIED POSITIVE PHOTO RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
摘要
申请公布号	KR100865063(B1)	申请公布日期	2008.10.23
申请号	KR20077017294	申请日期	2007.07.26
申请人		发明人
分类号	G03F7/039;G03F7/16	主分类号	G03F7/039
代理机构		代理人
主权项
地址

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