| 摘要 |
PROBLEM TO BE SOLVED: To provide a deposited film formation apparatus and a deposited film formation method in which, with respect to a cylindrical substrate, a film having the reduced unevenness of film quality in the axial direction can be formed, an image having high quality and uniformity can be formed, and further, deterioration in the cylindricity of the cylindrical substrate and the deformation in the edge parts are suppressed. SOLUTION: A deposited film formation apparatus 2 includes: a film formation chamber 23 for storing a cylindrical substrate 10 as an object for film formation; a heat energy generating means 25 for applying heat energy to the cylindrical substrate 10 from the inner circumferential face thereof; and a plasma generating means 30 for generating plasma by glow discharge and further applying heat energy from the outer circumferential face of the cylindrical substrate 10. The heat energy applied to the cylindrical substrate 10 by the heat energy generating means 25 is lower than the heat energy applied to the cylindrical substrate 10 by the plasma generating means 30. COPYRIGHT: (C)2009,JPO&INPIT
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