发明名称 SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To reduce the resistance, increase the withstand voltage, and improve the reverse recovery characteristic of a Schottky barrier diode in a super junction structure. SOLUTION: In the super junction structure, an N column 20 and a P column 30 constitute the Schottky barrier diode. Lattice defects are formed in the entire super junction structure, and a region with the lattice defects formed serves as a life time control region 50. Thus, the life time of minority carriers in the N column 20 and P column 30 can be shortened while a current flowing in the reverse direction can be reduced, and the reverse recovery characteristic of the semiconductor device can be improved. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008258313(A) 申请公布日期 2008.10.23
申请号 JP20070097416 申请日期 2007.04.03
申请人 DENSO CORP 发明人 SAKAKIBARA JUN;YAMAGUCHI HITOSHI
分类号 H01L29/47;H01L21/322;H01L21/336;H01L21/8234;H01L27/04;H01L27/06;H01L27/088;H01L29/06;H01L29/78;H01L29/861;H01L29/872 主分类号 H01L29/47
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