发明名称 VAPOR DEPOSITION MASK, AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition mask which can satisfactory secure its matching precision to the substrate to be vapor-deposited at ordinary temperature even upon temperature rising in a vapor deposition furnace, thus a luminescent layer can be formed at high precision with satisfactory reproducibility, and to provide a method for producing the same. SOLUTION: Since a mask layer 2 provided with vapor deposition patterns composed of vapor deposition through holes 5 is stacked with supporting layers 3 each made of a material having a low thermal linear expansion coefficient not so as to be lapped with the vapor deposition through holes 5, not only the strength of the mask itself increases, but also a shape change caused by the influence of heat is suppressed, namely, a mispositioning between the vapor deposition mask 1 and the substrate 20 to be vapor-deposited in a high temperature environment upon a vapor deposition operation can be remarkably reduced. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008255449(A) 申请公布日期 2008.10.23
申请号 JP20070101262 申请日期 2007.04.09
申请人 KYUSHU HITACHI MAXELL LTD 发明人 KOBAYASHI YOSHIHIRO;TAMARU HIROHITO;ISHIKAWA KIICHIRO
分类号 C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/24
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