ULTRA SMOOTH FACE SPUTTER TARGETS AND METHODS OF PRODUCING SAME
摘要
<p>A method is provided to remove a thickness of a sputter target surface deformation layer to thereby achieve a reduced burn-in time during sputtering operations. The method comprises extrusion hone polishing of the target surface with a visco-elastic abrasive medium.</p>
申请公布号
WO2008127493(A1)
申请公布日期
2008.10.23
申请号
WO2008US01145
申请日期
2008.01.29
申请人
TOSOH SMD, INC.;BANKS, TERRY, L.;SMATHERS, DAVID, B.
