| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem that a high manufacturing yield can not be obtained by a method of forming a polarization inversion structure in a nonlinear optical crystal substrate since an electric field leaks to a non-polarization-inversion surface and a polarization inversion region becomes heterogeneous. SOLUTION: In a stage of forming an electrode for periodic polarization inversion, a sacrificial layer is provided on the non-polarization-inversion surface, and removed after an electrode is formed on the polarization inversion surface to form an air layer on the non-polarization-inversion surface. Consequently, when a voltage is applied to the electrode, a dielectric breakdown and an electric field leak are suppressed and the electrode width can be controlled to size precision of photolithography by using the sacrificial layer, so a periodic polarization inversion structure with good size precision can efficiently be manufactured. COPYRIGHT: (C)2009,JPO&INPIT
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