| 摘要 |
Processes for removing inorganic impurities from HCl-containing gases, which processes comprise: providing a crude gas stream comprising hydrogen chloride and at least one inorganic component; introducing the crude gas stream into an adsorber bed; adsorbing at least a portion of the at least one inorganic component from the crude gas stream on the adsorber bed to form a purified HCl gas, and removing the purified HCl gas from the adsorber bed.
|
