METHOD FOR MANUFACTURING PHASE SHIFT MASK BLANK AND DEVICE FOR MANUFACTURING PHASE SHIFT MASK BLANK

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a phase shift mask blank by which variation in a phase angle and transmittance among blanks and within a blank plane can be reduced as much as possible and high yield is obtained.

SOLUTION: The method for manufacturing a photomask blank having a thin film for forming at least a pattern on a transparent substrate 6 by a DC magnetron sputtering method is characterized in that: the thin film is deposited by rotating the substrate 6 on a horizontal plane with the film deposition surface made of a flat plane upward and sputtering a single target 5 which faces the film deposition surface with inclination; and the transparent substrate is rotated the integral number of times from the start to the end of the film deposition.

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