| 摘要 |
<p>A method for manufacturing a photomask for suppressing the haze is provided to improve a yield in a manufacturing process and to shorten the manufacturing time by suppressing haze defects. A mask pattern(211,233) is formed on an upper surface of a transparent substrate(100). A surface process is performed on the transparent substrate by using H2O vapor plasma, in order to remove residual impurities(410,430) on the mask pattern and the transparent substrate. An O3 sputtering process is performed on the surface-processed mask pattern and the substrate. The O3 sputtering process is performed to induce a surface protection oxide layer on the mask pattern. A cleaning process is performed to clean the mask pattern prior to the surface process.</p> |
