| 摘要 |
An apparatus and a method for measuring surface profile using a polarization interferometer are provided to optimize the visibility of an interference signal due to a measurement light and a reference light by adjusting the reflectance of the reference surface with respect to the measurement surface. An apparatus for measuring surface profile using a polarization interferometer comprises an optical source part, an optical path separating part, an interference signal generating part, a sensitivity adjusting part for an optical detector, a fine transfer part, and a signal detecting part. The optical source part irradiates light to a measurement sample and a different reference surface. The optical path separating part splits the light irradiated to the different reference surface into vertically polarized light and horizontally polarized light and projects the polarized lights to a vertical polarization reference surface(210) and a horizontal polarization reference surface(212). The interference signal generating part generates two interference signals vertically or horizontally separated based on a measurement light and a reference light. The sensitivity adjusting part adjusts setting of optical detectors(216,217). The fine transfer part finely transfers the optical interferometer with respect to the measurement sample via a transfer module. The signal detecting part has the optical detectors for detecting the interference light signals. The surface profile of the measurement sample is calculated by analyzing information on a transfer distance and the interference signals.
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