发明名称 METHOD FOR MANUFACTURING SUBSTRATE, AND SURFACE TREATING AGENT FOR COPPER USED IN THE SAME
摘要 A method for manufacturing a substrate and a surface treating agent for copper used in the same are provided to form a uniform organic film on the surface of the copper at high density by promoting a coordinate bond of the copper and an organic material through alkylamine derivatives. A method for manufacturing a substrate includes the steps of: contacting a treating solution containing aminotetrazole compounds, aminotriazole compounds, and alkylamine derivatives to at least one of the surfaces of copper and a copper alloy; and forming a resist layer on the surface of the copper or the copper alloy in contact with the treating agent. The treating agent contains aminotetrazole compounds of more than 0.05 wt%, aminotriazole compounds of more than 0.1wt%, alkylamine derivatives of 0.1wt% to 10wt%, and water.
申请公布号 KR20080090272(A) 申请公布日期 2008.10.08
申请号 KR20080022750 申请日期 2008.03.12
申请人 MEC CO., LTD. 发明人 KAWAGUCHI MUTSUYUKI
分类号 H05K3/46 主分类号 H05K3/46
代理机构 代理人
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