发明名称 |
Electrostatic Charge Measurement Method, Focus Adjustment Method, And Scanning Electron Microscope |
摘要 |
The present invention aims to provide a method and a device of capable of suppressing error in electrostatic charge amount or defocus on the basis of electrostatic charge storage due to electron beam scanning when measuring the electrostatic charge amount of the sample or a focus adjustment amount by scanning the electron beam. In order to achieve the above object, according to one aspect of the present invention, an electrostatic charge measurement method, a focus adjustment method, or a scanning electron microscope for measuring an electrostatic charge amount or controlling an application voltage to the sample by changing the application voltage to the energy filter while moving the scanning location of the electron beam on the sample is proposed.
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申请公布号 |
US2008203298(A1) |
申请公布日期 |
2008.08.28 |
申请号 |
US20080038641 |
申请日期 |
2008.02.27 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
ISHIJIMA TATSUAKI;SASADA KATSUHIRO;FUKAYA RITSUO |
分类号 |
G01N23/00 |
主分类号 |
G01N23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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