| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask which can prevent a size of a pattern, which is formed on a photosensitive material, from varying due to a local flare, and also to provide a pattern-forming method using the photomask. <P>SOLUTION: A main pattern light shielding part 1, which transfers a pattern to a photosensitive material, is formed on the photomask. The area of the photomask except the part, in which at least the main pattern light shielding part 1 is formed, is composed of a semi transparent part 3. <P>COPYRIGHT: (C)2008,JPO&INPIT |
