| 摘要 |
<p>A blank mask and a method of manufacturing a photo-mask using the same are provided to implement a thin photoresist by stacking a hard mask layer before photoresist coating. A blank mask includes a transparent substrate(1), a light shielding film(3), an anti-reflection coating(4), a hard mask film(5), and a photoresist(6). The light shielding film is stacked on the transparent substrate. The anti-reflection coating is stacked on the light shielding film. The hard mask film is stacked on the anti-reflection coating. The photoresist is coated on the hard mask film. The hard mask film has the same etching characteristic as the light shielding film and different etching characteristic from the anti-reflection coating.</p> |
