| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film deposition system which can reduce radiant heat in the electron beam vapor deposition of an active material layer or the like used for an electrode plate of an electric battery, and to provide a film deposition method which uses the film deposition system, is excellent in productivity and stability, and by which the problem of thermal load not only in the electrical battery application but also in the wide and general vacuum film deposition systems can be solved. <P>SOLUTION: Film deposition is carried out by an evaporation mechanism in which the upper surface of a vessel 32 for holding an evaporation material 31 is divided into three or more melting surface areas by a shielding plate 37 for shielding a portion of the surface of the vessel 32, and respective melting surface areas are selectively irradiated with an electron beam. <P>COPYRIGHT: (C)2008,JPO&INPIT |
