发明名称 |
Composition for forming anti-reflective coating for use in lithography |
摘要 |
There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.
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申请公布号 |
US2008206680(A1) |
申请公布日期 |
2008.08.28 |
申请号 |
US20070979448 |
申请日期 |
2007.11.02 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
KISHIOKA TAKAHIRO;MIZUSAWA KEN-ICHI;ENOMOTO TOMOYUKI;SAKAMOTO RIKIMARU;NAKAYAMA KEISUKE;KAWAMURA YASUO |
分类号 |
G03F7/26;B05D3/02;G03F7/00;G03F7/038;G03F7/09;H01L21/027 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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