| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus which can inhibit the formation of particles and simultaneously reduce a working loss of a facility. SOLUTION: This vapor deposition apparatus comprises: a plurality of cooling tanks 7a to 7c which are arranged at a position opposing to the surface to be film-formed of a substrate 3 mounted on a disc 2, in such a concentric form as to surround a center part of the disc 2; an opposing plate 8 provided between the plurality of cooling tanks 7a to 7c and the disc 2; a heater 1 for heating the substrate 3 mounted on the disc 2 from the opposing side to the cooling tanks 7a to 7c; and cooling tank driving means 11a to 11c which independently change a space between each of the cooling tanks 7a to 7c and the opposing plate 8, respectively. The apparatus having the above structure can easily decrease a temperature gradient of a temperature distribution in the opposing plate 8 and can inhibit a film deposited on the opposing plate 8 from exfoliating. COPYRIGHT: (C)2008,JPO&INPIT
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