发明名称 METHOD FOR DETERMINING SUBSTRATE POSITION AND, METHOD AND DEVICE FOR PROCESSING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for determining a position of a substrate disposed on a supporting plate, and also to provide a method and device for processing the substrate. SOLUTION: The position of the substrate disposed on the supporting plate is known by measuring a temperature of the supporting plate. The substrate is disposed on the supporting plate, then the temperature of the substrate is measured, and the measured temperature is compared with a reference temperature, when the measured temperature is within the reference temperature, it is determined that the substrate is disposed in a correct position, while when the measured temperature is not within the reference temperature, it is determined that the substrate is not disposed at a correct position. When it is determined that the substrate is not disposed at a correct position, an alarm is generated or process step for the substrate is interrupted. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008199023(A) 申请公布日期 2008.08.28
申请号 JP20080029993 申请日期 2008.02.12
申请人 PSK INC 发明人 SEI RAKUHAN
分类号 H01L21/68;H01L21/02;H01L21/3065 主分类号 H01L21/68
代理机构 代理人
主权项
地址