发明名称 TWO-FLUID CLEANING CONTROL METHOD AND TWO-FLUID CLEANING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a two-fluid cleaning control method and a two-fluid cleaning apparatus for preventing a liquid from flowing backward into gas piping of a two-fluid jet nozzle. SOLUTION: The two-fluid cleaning control method comprises the step 100 of supplying a gas to a two-fluid jet means by a gas supply means, the step 110, 120 of supplying a liquid to the two-fluid jet means by a liquid supply means after the passage of a predetermined time from the start of the gas supply, and the step 130, 140 of judging gas pressure of the gas supply means, and stopping the liquid supply by the liquid supply means when the gas pressure becomes equal to or lower than a predetermined value. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008194653(A) 申请公布日期 2008.08.28
申请号 JP20070035294 申请日期 2007.02.15
申请人 SHIMADA PHYS & CHEM IND CO LTD 发明人 SUZUKI TOSHINOBU;NAGANO MASAHIRO;INOUE KAZUYASU;HATAKE KAZUO;SHIMADA KIYOSHI
分类号 B08B3/02;B05B7/12;G02F1/13;G02F1/1333;H01L21/304 主分类号 B08B3/02
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