发明名称 Thin film transistor and method of manufacturing the same
摘要 Provided are a thin film transistor and a method of manufacturing the same. The thin film transistor may include a gate; a channel layer; a source and a drain, the source and the drain being formed of metal; and a metal oxide layer, the metal oxide layer being formed between the channel layer and the source and the drain. The metal oxide layer may have a gradually changing metal content between the channel layer and the source and the drain.
申请公布号 US2008203387(A1) 申请公布日期 2008.08.28
申请号 US20080007038 申请日期 2008.01.04
申请人 SAMSUNG ELECTRONICS CO., LTD 发明人 KANG DONG-HUN;GENRIKH STEFANOVICH;SONG I-HUN;PARK YOUNG-SOO;KIM CHANG-JUNG
分类号 H01L29/221;H01L21/441 主分类号 H01L29/221
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