发明名称 Image sensor with optical guard ring and fabrication method thereof
摘要 An image sensor device and fabrication method thereof wherein a substrate having at least one shallow trench isolation structure therein is provided. At least one photosensor and at least one light emitting element, e.g., such as MOS or LED, are formed in the substrate. The photosensor and the light emitting element are isolated by the shallow trench isolation structure. An opening is formed in the shallow trench isolation structure to expose part of the substrate. An opaque shield is formed in the opening to prevent photons from the light emitting element from striking the photosensor.
申请公布号 US7387907(B2) 申请公布日期 2008.06.17
申请号 US20060517296 申请日期 2006.09.08
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 HSU TZU-HSUAN;YAUNG DUN-NIAN;FANG YEAN-KUEN
分类号 H01L21/00;H01L25/16;H01L27/146;H01L27/148;H01L27/15 主分类号 H01L21/00
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