PHOTORESIST COMPOSITION FOR SPRAY COATING AND LAMINATE

摘要

On a substrate provided on its coating surface with step portion (1) of 10 to 1000 mum level difference (H), photoresist layer (2) is formed with the use of a photoresist composition containing a modified siloxane surfactant by spray coating technique. Thus, there is obtained a laminate having the step portion (1) whose top face (1a) and side face (1b) are continuously covered by the photoresist layer (2), wherein the thickness of photoresist layer (2) on the top face (1a) of the step portion is in the range of 1 to 40 mum, and wherein the layer thickness at the border of side face (1b) and top face (1a) of the step portion is 75% or more of the layer thickness on the top face (1a) adjacent to the border.