发明名称 |
Plasma reactor including helical electrodes |
摘要 |
A device for forming an ion sheath in a plasma to deposit coatings on a non-conducting substrate. The device comprises a tubular reaction chamber having an outer surface wound helically with a first electrode having a first width. Helical winding of the first electrode provides a plurality of first wraps around the outer surface of the tubular reaction chamber. The device further includes a second electrode having a second width that is larger than the first width. Helical winding of the second electrode provides a plurality of second wraps alternating with the first wraps around the outer surface of the tubular reaction chamber. An ion sheath in a plasma forms to a thickness extending at least to the longitudinal axis of the tubular reaction chamber when the first electrode has a connection to a source of radio-frequency power and the second electrode provides a path to ground.
|
申请公布号 |
US7387081(B2) |
申请公布日期 |
2008.06.17 |
申请号 |
US20030349844 |
申请日期 |
2003.01.23 |
申请人 |
3M INNOVATIVE PROPERTIES COMPANY |
发明人 |
DAVID MOSES M.;GIFFORD MICHAEL C. |
分类号 |
C23C16/00;C23C16/509;C23C16/54;H01J37/32;H01L21/306 |
主分类号 |
C23C16/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|