发明名称 Broadband Techniques to Reduce the Effects of Impedance Mismatch in Plasma Chambers
摘要 A plasma generator system for reducing the effects of impedance mismatch. The system has a variable frequency source having an output for emitting an RF signal. A plasma chamber has an input for receiving the RF signal. The variable frequency source modulates at least one of the frequency and phase of the RF signal to improve the system tolerance of impedance mismatches between the output of the variable frequency source and the input of the plasma chamber.
申请公布号 US2007107844(A1) 申请公布日期 2007.05.17
申请号 US20050164303 申请日期 2005.11.17
申请人 BULLOCK SCOTT R;RADOMSKI AARON;IRVINE BRENT 发明人 BULLOCK SCOTT R.;RADOMSKI AARON;IRVINE BRENT
分类号 C23F1/00 主分类号 C23F1/00
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