| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus difference control apparatus capable of reducing a measured dimension difference among a plurality of apparatuses by simply estimating generation factors of the apparatus difference to calibrate a scanning electron microscope apparatus based on the estimation result, and allowing further accurate dimension control of a wiring pattern. SOLUTION: This system and its method for controlling apparatus differences among apparatuses and apparatus differences due to temporal change in scanning electron microscope apparatuses are characterized by comprising measurement means 10, 301a, 301b; 18, 301a for measuring apparatus differences among the apparatuses and due to temporal change based on secondary electron image data obtained by imaging a standard wafer and nearly simultaneously measuring index values representing various kinds of apparatus statuses, apparatus difference factor analysis parts 301c and 301e for estimating apparatus difference generation factors by analyzing relationships among the apparatus differences measured by the measurement means and the index values representing the various kinds of apparatus statuses, and an output means 302 for displaying and outputting the apparatus difference generation factors estimated by the apparatus difference factor analysis part. COPYRIGHT: (C)2007,JPO&INPIT
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