ELECTRON BEAM TYPE DIMENSION MEASURING DEVICE, AND DIMENSION MEASURING METHOD USING IT

摘要

PROBLEM TO BE SOLVED: To provide an electron beam type dimension measuring device capable of achieving highly accurate dimension measurement even in the case of a sample requiring dimension measurement by a low S/N signal waveform such as a photoresist for ArF exposure, and a dimension measuring method using it.

SOLUTION: In this electron beam type dimension measuring device (length measuring SEM device), a partial waveform (or a partial image) of a sample signal waveform (or an image) acquired from a sample of the same kind as a dimension measuring object sample is registered beforehand, and waveform verification between a measuring object signal waveform (or an image) acquired from the dimension measuring object sample and a sample registered waveform is performed, and a dimension value of a dimension measuring object pattern is calculated based on the verification results.

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