发明名称 Thin film etching method and method of fabricating liquid crystal display device using the same
摘要 A thin film etching method includes forming a layer on a substrate, aligning a mask having a pattern defined thereon above the layer, and removing a portion of the layer by irradiating the substrate with a femtosecond laser through the mask.
申请公布号 US2006099747(A1) 申请公布日期 2006.05.11
申请号 US20050246077 申请日期 2005.10.11
申请人 PARK JEONG K 发明人 PARK JEONG K.
分类号 H01L21/84;H01L21/00 主分类号 H01L21/84
代理机构 代理人
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