发明名称 ELECTROLYTIC PROCESSING APPARATUS AND ELECTROLYTIC PROCESSING METHOD
摘要 An electrolytic processing apparatus can maintain a difference in electric resistance between a recessed portion and a raised portion in the surface of a workpiece, thereby providing a processed surface with improved flatness. The electrolytic processing apparatus including: a processing electrode capable of bringing into contact with or closing to a workpiece; a feeding electrode for feeding electricity to the workpiece; a contact member disposed between the workpiece and at least one of the processing electrode and the feeding electrode, the degree of deformation of said contact member by a contact load applied from the workpiece being smal
申请公布号 WO2005090648(A3) 申请公布日期 2006.05.11
申请号 WO2005JP05301 申请日期 2005.03.16
申请人 EBARA CORPORATION;NOJI, IKUTARO;YASUDA, HOZUMI;IIZUMI, TAKESHI;KOBATA, ITSUKI;HIROKAWA, KAZUTO;SAITO, TAKAYUKI;SUZUKI, TSUKURU;TOMA, YASUSHI;KODERA, AKIRA 发明人 NOJI, IKUTARO;YASUDA, HOZUMI;IIZUMI, TAKESHI;KOBATA, ITSUKI;HIROKAWA, KAZUTO;SAITO, TAKAYUKI;SUZUKI, TSUKURU;TOMA, YASUSHI;KODERA, AKIRA
分类号 B23H5/08;B24B37/04;B24B53/007;C25F3/00;C25F3/02;C25F7/00;H01L21/321 主分类号 B23H5/08
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