| 发明名称 |
Physical vapor deposition chamber having an adjustable target |
| 摘要 |
The invention relates to physical vapor deposition (PVD) chambers having a rotatable substrate pedestal and at least one moveable tilted target. Embodiments of the invention facilitate deposition of highly uniform thin films.
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| 申请公布号 |
US2006096851(A1) |
申请公布日期 |
2006.05.11 |
| 申请号 |
US20040984291 |
申请日期 |
2004.11.08 |
| 申请人 |
LAVITSKY ILYA;ROSENSTEIN MICHAEL;YOSHIDOME GOICHI;WANG HOUGONG;LIU ZHENDONG;YE MENGQI |
发明人 |
LAVITSKY ILYA;ROSENSTEIN MICHAEL;YOSHIDOME GOICHI;WANG HOUGONG;LIU ZHENDONG;YE MENGQI |
| 分类号 |
C23C14/32;C23C14/00 |
主分类号 |
C23C14/32 |
| 代理机构 |
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| 主权项 |
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