| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing method and a device capable of providing high shaping precision while stably moving a polishing object and a polishing plate without skilled technology. SOLUTION: This polishing device to polish the polishing object 1 by relative sliding of the polishing object 1 and a polishing tool 2 by putting a polishing surface of the polishing tool 2 on a polishing surface of the polishing object 1 is furnished with a means to oscillate either of the polishing object 1 and the polishing tool 2 around an axis of rotation (18 or 19) by moving it to a position inclining or slipping the axis of rotation (18 or 19) against the other, a means to respectively and independently rotate and drive the polishing object 1 and the polishing tool 2 and a control means to continuously change positions of the moved axis of rotation (18 or 19) in the middle of working. COPYRIGHT: (C)2006,JPO&NCIPI
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