发明名称 |
Exposure apparatus, exposure method, and method for producing device |
摘要 |
A liquid immersion photolithography system has an exposure system that exposes an exposure area on a substrate with electromagnetic radiation and includes a projection optical system. In addition, a liquid flow is provided between the projection optical system and the exposure area. Further, a member at one side of the projection optical system provides the liquid flow having a desired velocity profile when the liquid flow is present in the exposure area.
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申请公布号 |
US2006098178(A1) |
申请公布日期 |
2006.05.11 |
申请号 |
US20050312477 |
申请日期 |
2005.12.21 |
申请人 |
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发明人 |
NAGASAKA HIROYUKI;MAGOME NOBUTAKA |
分类号 |
G03B27/42;G03F7/20 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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