发明名称 PATTERN TESTING APPARATUS, PATTERN TESTING METHOD, AND PATTERN TESTING PROGRAM
摘要 <p>A defect test having a possible high precision is achieved by producing, from captured images and design data, reference images in which aging of blur has been reflected. There are included a point spread function estimating part (23) for estimating a point spread function from an observed image and design information; a convolution image generating part (31) for generating a convolution image through a convolution of the point spread function to the design information; a reference image generating part (32) for generating a reference image from the convolution image obtained by the convolution image generating part; and an image comparing part (33) for comparing the observed image with the reference image so as to detect a defect of the pattern.</p>
申请公布号 WO2006049243(A1) 申请公布日期 2006.05.11
申请号 WO2005JP20282 申请日期 2005.11.04
申请人 NEC CORPORATION;MIYANO, HIROYOSHI 发明人 MIYANO, HIROYOSHI
分类号 G01N21/956;G01B11/30;G03F1/00;G06T1/00;H01L21/027 主分类号 G01N21/956
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