发明名称 |
Methods of forming nanoparticle based monolayer films with high particle density and devices including the same |
摘要 |
The present invention provides methods of forming uniform nanoparticle based monolayer films with a high particle density on the surface of a substrate comprising (a) forming a surface modifying layer on a substrate using a material comprising a first functional group that chemically binds to the substrate and a second functional group comprising a group capable of forming van der Waals forces, (b) applying to the surface modifying layer a solution comprising nanoparticles, and (c) curing the resultant structure formed at step (b) for a predetermined time to form a nanoparticle based monolayer film. The present invention further provides substrates and devices comprising the nanoparticle based monolayer films. |
申请公布号 |
US2006099430(A1) |
申请公布日期 |
2006.05.11 |
申请号 |
US20050190214 |
申请日期 |
2005.07.26 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SUBRAMANYA KOLAKE M.;YEO IN-SEOK |
分类号 |
B32B9/04 |
主分类号 |
B32B9/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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