| 摘要 |
PROBLEM TO BE SOLVED: To provide a system and a method for pattern defect inspection which can speed up detailed analysis of detected pattern defect in semiconductor circuit pattern formation process, by skipping visual reinspection through a review device. SOLUTION: In this method, a means of synchronization with detection of defects to calculates amount of image features of the defect, and a means for classifying defects into clusters, depending on the calculated amount of image features are added to the high-speed pattern defect inspection system. COPYRIGHT: (C)2006,JPO&NCIPI
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