发明名称 PATTERN FORMATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a pattern formation method for forming a pattern in a thin line shape precisely and stably. SOLUTION: The method for forming a prescribed pattern by discharging a functional liquid L onto a substrate by using a droplet discharge method comprises a process for forming a bank B so that the substrate has a first region 34A having width that is larger than the flight path of the functional liquid L, and a second region 34B having width that is narrower than the first region 34A; a process for discharging a solvent La contained in the functional liquid L to the second region 34B; and a process for discharging the functional liquid L to the first region 34A for allowing the functional liquid L to flow to the second region 34B. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006114930(A) 申请公布日期 2006.04.27
申请号 JP20050365341 申请日期 2005.12.19
申请人 SEIKO EPSON CORP 发明人 HIRAI TOSHIMITSU;MIKOSHIBA TOSHIAKI
分类号 H01L21/288;H01L21/3205;H01L21/336;H01L29/786 主分类号 H01L21/288
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