| 摘要 |
PROBLEM TO BE SOLVED: To provide an ultraviolet irradiation processing equipment capable of evenly irradiating the processed substrate with ultraviolet rays when the processed substrate is large-sized, when a plurality of processed substrates are simultaneously processed or the like. SOLUTION: The equipment is provided with a processing chamber 3, a substrate retainer 10 which is provided in the processing chamber 3 and retains the substrate 91 on which the irradiation processing is performed with the ultraviolet rays, an ultraviolet-ray source 13 provided in the processing chamber 3 as opposed to the substrate retaining surface 12 of the substrate retainer 10, and a reflector 15 provided between the ultraviolet-ray source 13 and the substrate retaining surface 12 and changes the irradiation direction of the ultraviolet rays from the ultraviolet-ray source 13. Further, the reflector 15 is designed to move the reflecting surface of the ultraviolet rays upwardly and downwardly or change the angle of the reflecting surface. COPYRIGHT: (C)2006,JPO&NCIPI
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