发明名称 |
Preparation of microelectromechanical system device using an anti-stiction material and selective plasma sputtering |
摘要 |
A method for preparing a microelectromechanical system (MEMS) device for subsequent processing is disclosed. The method includes establishing an anti-stiction material on exposed surfaces of the MEMS device. The exposed surfaces include at least an interior surface of a chamber and an external surface of the MEMS device. The anti-stiction material is selectively removed from at least a portion of the external surface via a plasma sputtering process under controlled conditions.
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申请公布号 |
US7443001(B2) |
申请公布日期 |
2008.10.28 |
申请号 |
US20060541993 |
申请日期 |
2006.10.02 |
申请人 |
HELWETT-PACKARD DEVELOPMENT COMPANY, L.P. |
发明人 |
CHEN CHIEN-HUA;REBOA PAUL FELICE;HALUZAK CHARLES C. |
分类号 |
H01L21/00;H01L21/302 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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