发明名称 |
Apparatus and method for testing defects |
摘要 |
A defect inspection apparatus includes an illumination optical unit for obliquely illuminating an object with a slit-like shaped laser, a first detection optical unit for detecting a first image formed by light reflected from the object by the illumination of the slit-like shaped laser and reflected in a first direction substantially normal to a surface of the object, a second detection optical unit for detecting a second image formed by light reflected from the object by the illumination of the slit-like shaped laser and reflected in a second direction inclined to the normal direction to the surface of the object, an image signal processing unit which processes a signal outputted from the first detection optical unit and a signal outputted from the second detection optical unit, and an output unit which outputs information processed by the image signal processing unit.
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申请公布号 |
US7443496(B2) |
申请公布日期 |
2008.10.28 |
申请号 |
US20070681996 |
申请日期 |
2007.03.05 |
申请人 |
HITACHI, LTD.;HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
NOGUCHI MINORI;OHSHIMA YOSHIMASA;NISHIYAMA HIDETOSHI;MATSUMOTO SHUNICHI;KEMBO YUKIO;MATSUNAGA RYOUJI;SAKAI KEIJI;NINOMIYA TAKANORI;WATANABE TETSUYA;NAKAMURA HISATO;JINGU TAKAHIRO;MORISHIGE YOSHIO;CHIKAMATSU SHUICHI |
分类号 |
G01N21/00;G01N21/94;G01N21/95;G01N21/956;G01R31/308;H01J37/00;H01L21/00;H01L21/66;H01L21/68 |
主分类号 |
G01N21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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