发明名称 Apparatus and method for testing defects
摘要 A defect inspection apparatus includes an illumination optical unit for obliquely illuminating an object with a slit-like shaped laser, a first detection optical unit for detecting a first image formed by light reflected from the object by the illumination of the slit-like shaped laser and reflected in a first direction substantially normal to a surface of the object, a second detection optical unit for detecting a second image formed by light reflected from the object by the illumination of the slit-like shaped laser and reflected in a second direction inclined to the normal direction to the surface of the object, an image signal processing unit which processes a signal outputted from the first detection optical unit and a signal outputted from the second detection optical unit, and an output unit which outputs information processed by the image signal processing unit.
申请公布号 US7443496(B2) 申请公布日期 2008.10.28
申请号 US20070681996 申请日期 2007.03.05
申请人 HITACHI, LTD.;HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 NOGUCHI MINORI;OHSHIMA YOSHIMASA;NISHIYAMA HIDETOSHI;MATSUMOTO SHUNICHI;KEMBO YUKIO;MATSUNAGA RYOUJI;SAKAI KEIJI;NINOMIYA TAKANORI;WATANABE TETSUYA;NAKAMURA HISATO;JINGU TAKAHIRO;MORISHIGE YOSHIO;CHIKAMATSU SHUICHI
分类号 G01N21/00;G01N21/94;G01N21/95;G01N21/956;G01R31/308;H01J37/00;H01L21/00;H01L21/66;H01L21/68 主分类号 G01N21/00
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