发明名称 |
Stabilization of nitrogen-containing and oxygen-containing organosilanes using weakly basic ion-exchange resins |
摘要 |
A process to stabilize nitrogen-containing or oxygen-containing organosilane from acid catalyzed attack and retard the resulting decomposition is disclosed. Such organosilanes, and the nitrogen-containing organosilane in particular, with a least one Si-H or N-H group are susceptible to this type of product decomposition. Treatment with a weakly basic ion exchange media retards this decomposition by scavenging the anions or acids that are attacking the Si-H group. Dilute exposures to these anions can initiate significant decomposition and effect product stability and long-term shelf-life for semiconductor processing for the use of silicon oxide, silicon oxynitride and silicon nitride films.
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申请公布号 |
US7442822(B2) |
申请公布日期 |
2008.10.28 |
申请号 |
US20060514650 |
申请日期 |
2006.09.01 |
申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
BOWEN HEATHER REGINA;LEI XINJIAN;SENECAL LEE ARTHUR |
分类号 |
C07F7/10 |
主分类号 |
C07F7/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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