| 摘要 |
<p>A method for fabricating a photo mask is provided to prevent haze defects caused by a reaction of air and ionic molecules by blocking the ionic molecules from the outside through a protective layer. A light blocking layer and a resist layer are sequentially formed on a mask substrate(100). A light blocking layer pattern(111) and a resist layer pattern are formed by using an electronic beam lithography. A region of the mask substrate exposed by the light blocking layer pattern is a light transmission region, and a region with the light blocking layer pattern formed there on is a light blocking region. A protective layer(130) is formed on the mask substrate and the light blocking layer pattern. The protective layer is formed with a nitride layer through CVD(Chemical Vapor Deposition) or sputtering. A pellicle is formed to face the light blocking layer pattern. The pellicle includes a pellicle layer(140) and a frame(141) supporting the pellicle layer. An air hole is arranged on a lateral side of the frame.</p> |
