| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin composition for forming a protective film, the composition resulting in a protective film that has no affinity to an immersion liquid, can suppress elution of a low molecular weight component from a resist layer or suppress swelling of a resist film, is easily removed in an alkali development process after exposure and gives a preferable pattern profile, and to provide a method for forming a liquid immersion exposure pattern by using the above composition. <P>SOLUTION: The resin composition for forming a resist protective film contains a polymer having a repeating unit expressed by formula (1). The resin composition preferably contains a polymer having a repeating unit expressed by formula (1) as well as a (meth)acrylate repeating unit having a fluorine atom. In the repeating unit expressed by formula (1), X is more preferably a carboxylic acid. In formula (1), R1 represents a 1-20C aliphatic straight-chain or cyclic group; R2 represents a 1-20C aliphatic straight-chain or cyclic group; and X represents an alkali-soluble functional group such as -COOH, -SO<SB>3</SB>H and -CH(CF<SB>3</SB>)OH. <P>COPYRIGHT: (C)2008,JPO&INPIT |
