发明名称 STAGE DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a stage device which prevents a relative positional shift between a stage and a board during the scanning of the stage, an exposure apparatus that uses the stage device, and a device manufacturing method that uses the exposure apparatus. <P>SOLUTION: The stage device has vacuum suction clamps 7A and 7B which are disposed at a pair of locations on a movable stage 21 across the barycenter of a reticle 6 on a straight line passing through the barycenter of the reticle 6; and the straight line parallel with the negative/positive directions of a Y direction that are first and second drive directions of the movable stage 6 carrying the reticle 6, and suck and hold the reticle 6. When moving in the first drive direction, the movable stage 21 moves with the vacuum suction clamp 7A in the positive direction of holding the reticle 6, and when moving in the second drive direction, the movable stage 21 moves with the vacuum suction clamp 7B in the negative direction of holding the reticle 6. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008159991(A) 申请公布日期 2008.07.10
申请号 JP20060349357 申请日期 2006.12.26
申请人 CANON INC 发明人 YAMANAKA TOSHIRO
分类号 H01L21/027;H01L21/68 主分类号 H01L21/027
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