ALICYCLIC STRUCTURE-CONTAINING CHLOROMETHYL ETHER, POLYMERIZABLE MONOMER FOR PHOTORESIST, AND METHOD FOR PRODUCING THE SAME

摘要

Disclosed is a composition for photoresists, namely a photosensitive material for photoresists which enables to improve roughness in a resist having an alkyladamantyl group or a lactone structure. This composition for photoresists contains a polymer which has an alicyclic structure-containing (meth)acrylate ester represented by the general formula (II) below as a constituent. (In the formula, R<SUP>1</SUP> represents a functional group having an alicyclic structure with 4-9 carbon atoms and having at least one ester group or keto group; and R<SUP>2</SUP> represents a hydrogen atom, a methyl group or a trifluoromethyl group.)