发明名称 F-DOPED QUARTZ GLASS AND PROCESS OF MAKING SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an F-doped quartz glass material used in the lithographic application operating at a shorter wavelength than about 300 nm, which shows a lower polarization-induced birefringence or preferably, does not show the polarization-induced birefringence substantially even after being subjected to 10 million pulses of linearly polarized pulsed laser beam at 157 nm having a fluence of 250μJ×cm<SP>-2</SP>×pulse<SP>-1</SP>and a pulse length of 30 ns. <P>SOLUTION: The F-doped synthetic quartz glass material contains, by weight, less than 50 ppm of Cl, less than 50 ppb of Na, less than 50 ppb in total of transition metals, and 0.1-5,000 ppm of fluorine. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008156206(A) 申请公布日期 2008.07.10
申请号 JP20070225718 申请日期 2007.08.31
申请人 CORNING INC 发明人 MOORE LISA A;SMITH CHARLENE M
分类号 C03C3/06;C03B8/04;C03B20/00;G02B1/02 主分类号 C03C3/06
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