COCRPT-BASED SPUTTERING TARGET AND METHOD FOR PRODUCTION THEREOF

摘要

Disclosed is a CoCrPt-based sputtering target which is reduced in the size and the quantity of a high-chromium particle having a high chromium atom content unevenly distributed in the sputtering target and therefore has increased target homogeneity, which is reduced in the formation of nodule or arcing, and which has a desired chemical composition. The CoCrPt-based sputtering target comprises cobalt, chromium, a ceramic material and platinum, wherein a high-chromium particle which has a high chromium atom content and is unevenly distributed in the sputtering target has a longest diameter of 40 µm or less.