| 摘要 |
PROBLEM TO BE SOLVED: To provide substrate treating equipment in which cleaning of a substrate to be treated is carried out effectively by preventing readhesion of contaminants to a cleaned substrate while enhancing throughput and reducing cost. SOLUTION: The substrate treating equipment 10 for cleaning a substrate G to be treated using cleaning liquid comprises a means 111 for forming a carrying passage 32 and carrying the substrate G to be treated on the carrying a passage 32 with the substrate G facing upward, and cleaning nozzles 114 and 116 for supplying cleaning liquid onto the upper surface of the substrate G to be carried. The carrying passage 32 has a horizontal portion for carrying the substrate G under horizontal state, and inclining portions 80a and 81a forming an ascending slope of a predetermined angle from the horizontal portion. The cleaning nozzles 114 and 116 are arranged above the inclining portions 80a and 81a, and the cleaning liquid ejecting direction is set in a direction inclining downward by a predetermined angle against the horizontal direction and toward the upstream direction of the carrying passage 32 so that the cleaning liquid is ejected toward the inclining surface of the substrate G carried on the inclining portions 80a and 81a. COPYRIGHT: (C)2008,JPO&INPIT
|
